The use of tightly controlled induction heating power supplies to vary the temperature of the semiconductor for this process is something our machines can easily accomplish. The MOCVD process can take in upwards of 2-Hours depending on the size of the reactor. induction heating processes seek rapid heat into the workpiece, the MOCVD process requires precise and steady PID temperature control so that cracking of the suceptor is eliminated. Reliable and robust equipment is key to the success of the MOCVD process.
MOCVD Reactors or (M)etal (O)rganic (C)hemical (V)apour (D)eposition is a technique for depositing a thin layer of atoms onto a semiconductor wafer. Using MOCVD you can build up many layers of precisely controlled thicknesses, to create a specific optical and electrical property.
DW-MF series of power supplies offer a wide range of frequencies (1-20 kHz) in power from 15 to 160kW, which correlates to technical effectiveness in a variety of customer applications. Designed with an adjustable tank capacitance and multi-tap output transformer, DW-MF induction heating systems are flexible and reliable to meet demanding manufacturing conditions.
All induction heating semiconductor process equipment and systems are equipped with diagnostic limit indicators for voltage, power, frequency and current, along with trip indicators for frequency, current, over temperature, door/cabinet interlock and water pressure. These indicators are located on the front panel for ease of diagnostic control. All induction heating systems are also equipped with a full scale meter display, which allows the user to monitor power output, voltage, frequency and current. Another piece of induction semiconductor processes equipment designed by DaWei is DW-HF series of induction heating power supplies, which are available in 15 to 120 kW power with a frequency range from 30-80kHz. The induction heating Systems are produced with adjustable capacitance and multi-tap output transformer to match a wide range of applications.